China's share fell at the end of 2024 after a high. EUV stands for systems with extreme ultraviolet exposure technology (13.5 nm and below). ArFi = immersion lithography with argon fluoride (193 nm); there is a layer of ultrapure water under the lens, which focuses the beams more strongly. ArF = Lithography with argon fluoride, without ultrapure water layer (193 nm). KrF = lithography with krypton fluoride (248 nm). I-Line uses light with a wavelength of 365 nm.
